Chinese scientists discover method to cut defects by 99% with DUV chipmaking equipment, but it destroys EUV pattern fidelity — analyzing photoresist clustering with cryo-ET at 105°C

https://www.tomshardware.com/tech-industry/semiconductors/chinese-scientists-discover-method-to-cut-defects-by-99-percent-with-duv-chipmaking-equipment-but-it-destroys-euv-pattern-fidelity-analyzing-photoresist-clustering-with-cryo-et-at-105-c